Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-07-14
1999-09-28
Chea, Thorl
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
4302711, 430945, 216 94, G03F 900
Patent
active
059586281
ABSTRACT:
Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.
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IBM Technical Disclosure Bulletin, vol. 17, No. 8, Jan. 1975, "Laminate Fabrication to Facilitate Laser Hole Drilling", Haining et al.
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Kenneth Mason Publicatuions Ltd., England, No. 269, Sep. 1986, "High Resolution Molybdenum Masks by Laser Etching".
Balz James Gregory
Kapfhammer Mark William
LaPlante Mark Joseph
Long David C.
Blecker Ira D.
Chea Thorl
International Business Machines - Corporation
Tomaszewski John J.
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