Formation of pattern using acrylamide-diacetoneacrylamide copoly

Details Formation of pattern using acrylamide-diacetoneacrylamide copoly Formation of pattern using acrylamide-diacetoneacrylamide copoly

1975-09-22

1978-04-25

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 36, 96 361, 96 91N, 96115R, 96115P, 427 68, G03C 500

Patent

active

040860906

ABSTRACT:
The present invention affords a process for forming a pattern having a surface area substantially equal to or smaller than area of apertures of shadow-mask through which beams pass on a photoresist film, which contains an acrylamidediacetoneacrylamide copolymer and a water-soluble aromatic bisazide compound, by exposing said photoresist film to light through a mask having the pattern and then developing the film.
The use of said photoresist film for the preparation of a phosphor screen of a color picture tube of a black matrix or black stripe type does not require a special technique such as post-etching of a shadow mask and makes it possible to form a three primary color phosphor pattern having a surface area substantially equal to or smaller than the area of apertures of the shadow mask through which lightbeams pass, without mutual "bridging" between phosphor dots. Thus, an excellent phosphor screen of a color picture tube of a black matrix or black stripe type can be prepared.

REFERENCES:
patent: 3278305 (1966-10-01), Laridon et al.
patent: 3475176 (1969-10-01), Rauner
patent: 3558310 (1971-01-01), Mayaud
patent: 3616370 (1971-10-01), Jennings
patent: 3715210 (1963-02-01), Watkinson et al.
patent: 3721566 (1973-03-01), Laridon et al.
patent: 3788846 (1974-01-01), Mayaud et al.
patent: 3884703 (1975-05-01), Oba et al.

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