Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...
Patent
1974-11-14
1976-07-27
Powell, William A.
Gas separation: apparatus
Electric field separation apparatus
Electrode cleaner, apparatus part flusher, discharger, or...
29530, 156 3, 156 11, 156 18, 427 97, 427 99, 427251, H01L 2184
Patent
active
039716619
ABSTRACT:
There is disclosed a method for producing in thick (0.005 inches) polyimide films or sheets, openings, or windows across each of which an electrical conductor, such as copper or aluminum extends. The windows may be of substantial dimensions typically 0.05 inches by 0.1 inches. The conductor is of substantial thickness of about 0.0008 to 0.001 inches. The sheet is coated with the conductor on both surfaces by being rotated in a stream of vapor of the conductor produced by impinging an electron beam (typically at 10 KV and 300 milliamperes) on a block of the conducting material. Photoresist is then deposited on both coated surfaces of the sheet and exposed under masks and developed so as to expose the conducting coating on each surface in the areas of the windows. The exposed coating is then removed with an acid etchant while the remainder of the surfaces remain protected by the developed photoresist. The polyimide in the areas of the windows is thus exposed. The exposed polyimide is then removed by hydrazine leaving windows in each surface with conductors extending across the windows on the respective opposite surfaces.
REFERENCES:
patent: 3222173 (1965-12-01), Belko, Jr. et al.
patent: 3311966 (1967-04-01), Shaheen et al.
patent: 3620815 (1971-11-01), Blecherman et al.
patent: 3672986 (1972-06-01), Schneble, Jr. et al.
patent: 3679500 (1972-07-01), Kubo et al.
patent: 3871930 (1975-03-01), Fish
Konsowski Stephen G.
Lindberg Frank A.
Ponemone Seymour J.
Shamash Maurice B.
Massie Jerome W.
Patterson H. W.
Powell William A.
Westinghouse Electric Corporation
LandOfFree
Formation of openings in dielectric sheet does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Formation of openings in dielectric sheet, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Formation of openings in dielectric sheet will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1623278