Formation of laser mirror facets and integration of optoelectron

Fishing – trapping – and vermin destroying

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148DIG26, 148DIG95, 148DIG106, 357 17, 372 46, 437 90, 437133, H01L 2120, H01L 21205

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active

049333020

ABSTRACT:
A planar process for fabricating an optoelectronic integrated circuit device is described. The process includes the in situ formation of laser diode mirror facets comprising the steps of providing a semi-insulating gallium arsenide substrate having thereon layers of n-doped gallium arsenide, n-doped aluminum gallium arsenide, and undoped gallium arsenide; patterning and etching the undoped gallium arsenide layer into a mandrel having substantially vertical walls; establishing insulator sidewalls on the vertical walls; removing the mandrel, thereby exposing the inner walls of the insulator sidewalls and leaving the insulator sidewalls self-standing; removing the aluminum gallium arsenide using the insulator sidewall as a mask; and forming a laser diode within the region between the insulator sidewalls and creating the mirror facets with the inner walls of the insulator sidewalls. Mirror facets formed in accordance with this process are substantially free of contaminants. The process is suitable for high level of monolithic integration, including the formation of other optical devices, such as waveguides, driver circuits, logic and other electronic circuits.

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