Formation of carbon-containing material

Details Formation of carbon-containing material Formation of carbon-containing material

2011-06-21

2011-06-21

Kornakov, Michael (Department: 1714)

Coating processes

Nonuniform coating

C427S408000, C427S561000

Reexamination Certificate

active

07964242

ABSTRACT:
A method includes forming ionic clusters of carbon-containing molecules, which molecules have carbon-carbon sp2bonds, and accelerating the clusters. A surface of a substrate is irradiated with the clusters. A material is formed on the surface using the carbon from the molecules. The material includes carbon and may optionally include hydrogen. The material may include graphene. The material may form a monolayer. The molecules may include one or more material selected from the group consisting of graphene, carbon allotropes, ethylene, and hydrocarbon molecules containing ethylenic moieties. A fused region may be formed in the substrate as an interface between the substrate and the material. The clusters may have diameters of at least 20 nanometers and may be accelerated to an energy of at least 0.5 keV.

REFERENCES:
patent: 6498107 (2002-12-01), Fenner
patent: 6797339 (2004-09-01), Akizuki et al.
patent: 7208191 (2007-04-01), Freedman
patent: 7824741 (2010-11-01), Sandhu
patent: 2003/0026990 (2003-02-01), Yamada et al.
patent: 2005/0163985 (2005-07-01), Dorfman
patent: 2005/0271574 (2005-12-01), Jang et al.
patent: 2005/0277246 (2005-12-01), Kirkpatrick et al.
patent: 2006/0177594 (2006-08-01), Nickel
patent: 2006/0261419 (2006-11-01), Kreupl et al.
patent: 2006/0292762 (2006-12-01), Borland et al.
patent: 2007/0053168 (2007-03-01), Sayir et al.
patent: 2007/0290287 (2007-12-01), Freedman
patent: 2008/0245974 (2008-10-01), Kirkpatrick et al.
patent: 2850400 (2004-07-01), None
patent: 6072217 (1985-04-01), None
patent: 6275545 (1987-04-01), None
patent: 8127867 (1996-05-01), None
patent: 200313208 (2003-01-01), None
patent: 200395627 (2003-04-01), None
patent: 200396555 (2003-04-01), None
patent: 2004043874 (2004-02-01), None
patent: 2005169816 (2005-06-01), None
patent: WO 0026431 (2000-05-01), None
patent: WO 0183238 (2001-11-01), None
patent: WO 2007002130 (2007-01-01), None
MacCrimmon, R., et al. “Gas cluster ion beam infusion processing of semiconductors” Nuclear Instruments and Methods in Physics, Research B, Sep. 21, 2005 pp. 427-430.
Orlowski, Marius “CMOS Challenges of Keeping up with Moore's Law” 13th Internationl Conference on Advanced Thermal Processing of Semiconductors—RTP Oct. 4, 2005 pp. 3-21.

Affiliated with

Also associated with

Rating

Formation of carbon-containing material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Formation of carbon-containing material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Formation of carbon-containing material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2726069