Formation of amorphous metal alloys by chemical vapor deposition

Details Formation of amorphous metal alloys by chemical vapor deposition Formation of amorphous metal alloys by chemical vapor deposition

1988-03-18

1990-05-29

Childs, Sadie

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427252, 4272552, B05D 314, C23C 1618

Patent

active

049294687

ABSTRACT:
Amorphous alloys are deposited by a process of thermal dissociation of mixtures or organometallic compounds and metalloid hydrides, e.g., transition metal carbonyl such as nickel carbonyl, and diborane. Various sizes and shapes of deposits can be achieved, including near-net-shape free standing articles, multilayer deposits, and the like. Manipulation or absence of a magnetic field affects the nature and the structure of the deposit.

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D. Wroge & D. Hess, "Plasma-Enhanced Deposition of Iron/Iron Oxide Films", Report LBL-9879, 1979, pp. 30-37.
M. Skibo & F. Greulich, "Characterization of Chemically Vapor Deposited NI-(0.05-0.20 wt. %)B Alloys", Thin Solid Films, vol. 113, 1984, pp. 225-234.
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H. Jones, "The Status of Rapid Solidification of Alloys in Research and Application", Journal of Materials Science, vol. 19, 1984, pp. 1043-1076.
H. Leamy & A. Dirks, "The Microstructure of Amorphous Rare-Earth/Transition-Metal Thin Films", Journal of Physics D: Applied Physics, vol. 10, 1977, pp. L95-L98.

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