Formation method of electroconductive pattern, and...

Details Formation method of electroconductive pattern, and... Formation method of electroconductive pattern, and...

2008-01-01

2008-01-01

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Manufacture of electrical device controlled printhead

C438S029000, C438S674000, C257SE21295

Reexamination Certificate

active

07314768

ABSTRACT:
In regard to an electroconductive pattern including a high resistivity region partially, by forming a pattern with a photosensitive resin, making the pattern absorb liquid containing a metal component, and baking this, an electroconductive film of metal oxide is formed, this electroconductive film is further covered by a gas shielding layer, and portions which are not shielded are reduced selectively to be made low resistance metal film regions. Since the material which constitutes the electroconductive pattern is hardly removed, a load concerning material reuse is mitigated and material cost is reduced.

REFERENCES:
patent: 6113448 (2000-09-01), Kobayashi et al.
patent: 6586155 (2003-07-01), Furuse et al.
patent: 6833224 (2004-12-01), Furuse et al.
patent: 6992434 (2006-01-01), Terada et al.
patent: 2004/0087239 (2004-05-01), Shimoda et al.
patent: 2005/0008955 (2005-01-01), Furuse et al.
patent: 2005/0266589 (2005-12-01), Furuse et al.
patent: 2006/0045961 (2006-03-01), Furuse et al.
patent: 2006/0057279 (2006-03-01), Terada et al.
patent: 5-114504 (1993-05-01), None

Affiliated with

Also associated with

Rating

Formation method of electroconductive pattern, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Formation method of electroconductive pattern, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Formation method of electroconductive pattern, and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2745085