Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1989-05-31
1990-09-04
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 28, 430176, 430179, 430196, 430197, G03F 7008, G03F 7021, G03C 134
Patent
active
049544187
ABSTRACT:
A photoresist film containing a phosphate of a formalin condensate of diazodiphenylamine, 2.5-bis(4'-azide-2'-sulphobenzilidene) cyclopentanone Na, polyvinylalcohol, and polyvinylpyrrolidone is formed on the inner surface of a faceplate. The photoresist film is hardened by light exposure using a point or linear light source, which is essentially a circular light source, via a shadow mask having a large number of apertures. A light absorbing film is formed on this photoresist film. Then the hardened photoresist film and the light absorbing film on top of it are removed using a peeling agent.
REFERENCES:
patent: 3917794 (1975-11-01), Akagi et al.
patent: 4491629 (1985-01-01), Koike et al.
patent: 4596755 (1986-06-01), Koike et al.
English Language Abstract (Derwent) of Japanese Publication #83-057094-B, 12/1953.
English Translation of Japanese Kokai Publication #58-57094, published 12/19/83 (Kobayashi et al.).
Bowers Jr. Charles L.
Kabushiki Kaisha Toshiba
LandOfFree
Formation method and photoresist composition for phosphor screen does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Formation method and photoresist composition for phosphor screen, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Formation method and photoresist composition for phosphor screen will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-441469