Wells – Processes – Graveling or filter forming
Reexamination Certificate
2006-09-26
2006-09-26
Neuder, William (Department: 3672)
Wells
Processes
Graveling or filter forming
C166S292000
Reexamination Certificate
active
07111683
ABSTRACT:
A formation consolidation process is described which comprises injecting into an unconsolidated or poorly consolidated subterranean formation penetrated by a wellbore an aqueous pumpable system comprising an insoluble silica source (e.g., colloidal silica, silica fume or fumed silica) and a source of calcium hydroxide (e.g., aqueous solutions of calcium chloride and sodium hydroxide). The aqueous system may contain a nucleation inhibitor. The components of the aqueous system react to produce a calcium silicate hydrate gel (C-S-H gel) having cementitious properties within the pores of the formation. After the C-S-H gel sets and hardens, the consolidated formation has a high compressive strength (e.g., 500 psi (about 3.5 MPa) or more). The technique can be performed as a remedial treatment or in new completions, but it is particularly useful in workover treatments for existing wells.
REFERENCES:
patent: 3593796 (1971-07-01), Stainback
patent: 3741308 (1973-06-01), Valey
patent: 5088555 (1992-02-01), Shu
patent: 5101901 (1992-04-01), Shu et al.
patent: 5304710 (1994-04-01), Kigel et al.
patent: 5355954 (1994-10-01), Onan et al.
patent: 5362318 (1994-11-01), Shu
patent: 5551514 (1996-09-01), Nelson et al.
patent: 6450260 (2002-09-01), James et al.
patent: 7013973 (2006-03-01), Danican et al.
Danican Samuel
Nelson Erik B.
Salamat Golchehreh
Curington Tim
Mitchell Thomas O.
Nava Robin
Neuder William
Schlumberger Technology Corporation
LandOfFree
Formation consolidation process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Formation consolidation process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Formation consolidation process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3570913