Foreign particle inspection apparatus and method with front and

Details Foreign particle inspection apparatus and method with front and Foreign particle inspection apparatus and method with front and

1994-06-30

1996-07-23

Gonzalez, Frank

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356240, G01N 2100

Patent

active

055395147

ABSTRACT:
A method of inspecting a phase shift reticle comprising a transparent or translucent substrate, a circuit pattern of an opaque film formed on the front surface of the substrate and a pattern of a transparent or translucent film formed on the front surface of the substrate comprises: obliquely projecting a front illuminating light beam on the front surface of the substrate by a front illuminating system; concentrating scattered light scattered by the surface of the substrate and the surfaces of the patterns, obliquely projecting a back illuminating light beam on the back surface of the substrate by a back illuminating system, concentrating transmitted-and-diffracted light transmitted and diffracted by the substrate and the patterns; intercepting the scattered light scattered by the patterns and the transmitted-and-diffracted light transmitted and diffracted by the patterns with spatial filters disposed on Fourier transform planes, focusing the scattered light and the transmitted-and-diffracted light transmitted by the spatial filters on detectors; and comparing detection signals provided by the detectors to see if there are any foreign particles on the phase shift reticle.

REFERENCES:
patent: 4922308 (1990-05-01), Noguchi et al.
patent: 4952058 (1990-08-01), Noguchi et al.
patent: 5098191 (1992-03-01), Noguchi et al.

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