Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2011-07-26
2011-07-26
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237100, C356S237500
Reexamination Certificate
active
07986405
ABSTRACT:
In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
REFERENCES:
patent: 4893932 (1990-01-01), Knollenberg
patent: 5402001 (1995-03-01), Hagi
patent: 5864394 (1999-01-01), Jordan et al.
patent: 6091075 (2000-07-01), Shibata et al.
patent: 6226079 (2001-05-01), Takeda et al.
patent: 6384909 (2002-05-01), Tomita et al.
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6597448 (2003-07-01), Nishiyama et al.
patent: 6683683 (2004-01-01), Tomita et al.
patent: 6862491 (2005-03-01), Levin et al.
patent: 7768635 (2010-08-01), Nakano et al.
patent: 2001/0030300 (2001-10-01), Shishido et al.
patent: 2002/0031248 (2002-03-01), Maed et al.
patent: 2002/0036769 (2002-03-01), Shimoda et al.
patent: 2003/0007677 (2003-01-01), Hiroi et al.
patent: 2003/0053676 (2003-03-01), Shimoda et al.
patent: 2004/0057044 (2004-03-01), Nikoonahad et al.
patent: 2005/0110986 (2005-05-01), Nikoonahad et al.
patent: 2006/0109457 (2006-05-01), Miller et al.
patent: 2006/0124874 (2006-06-01), Uto et al.
patent: 2006/0187446 (2006-08-01), Chang et al.
patent: 6-307826 (1994-11-01), None
patent: 9-74056 (1997-03-01), None
patent: 11-237344 (1999-08-01), None
patent: 2001-160572 (2001-06-01), None
patent: 2003-057193 (2003-02-01), None
patent: 2003-177101 (2003-06-01), None
patent: 2003-015164 (2004-07-01), None
patent: WO 2004/063734 (2004-07-01), None
Japanese Office Action, with English Translation, issued in Japanese Patent Application No. 2007-042228, dated Jun. 28, 2010.
Japanese Office Action, with English Translation, issued in Japanese Patent Application No. 2007-042251, dated Jun. 25, 2010.
Japanese Office Action, with partial English Translation, issued in Japanese Patent Application No. 2007-042251, mailed Feb. 8, 2011.
Fukushima Hideki
Imai Eiji
Kobayashi Mamoru
Morishige Yoshio
Nagoya Koichi
Akanbi Isiaka O
Chowdhury Tarifur
Hitachi High-Technologies Corporation
McDermott Will & Emery LLP
LandOfFree
Foreign matter inspection method and foreign matter... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Foreign matter inspection method and foreign matter..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Foreign matter inspection method and foreign matter... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2730647