Focusing method in photolithography

Details Focusing method in photolithography Focusing method in photolithography

1995-05-25

1996-10-01

Pendegrass, Joan H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, 355 55, G03F 7207

Patent

active

055614957

ABSTRACT:
A level F.sub.A at a shot center of a specified shot is measured. A level F.sub.B is measured at a nonexposure region. A level difference .DELTA.F is calculated based on the level F.sub.A at the shot center and the level F.sub.B at the nonexposure region. After the level difference .DELTA.F is calculated for all the specified shots, an average value .DELTA.F.sub.ave of level differences .DELTA.F is calculated. Thereafter, focusing based on the average value .DELTA.F.sub.ave and subsequent exposure are executed for the respective shots in a step-and-repeat manner. Thereby, a focusing method in photolithography enables formation of elements having good pattern configuration even if the pattern is miniaturized to a higher extent in accordance with high integration.

REFERENCES:
patent: 4902900 (1990-02-01), Kamiya et al.
patent: 5124562 (1992-06-01), Kawashima et al.
patent: 5266790 (1993-11-01), Markle et al.
patent: 5364051 (1994-11-01), Suzuki et al.
patent: 5461237 (1995-10-01), Wakamoto et al.

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