Focusing apparatus for uniform application of charged particle b

Details Focusing apparatus for uniform application of charged particle b Focusing apparatus for uniform application of charged particle b

1979-09-17

1981-06-30

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

250492A, G01K 108, H21J 314

Patent

active

042764777

ABSTRACT:
An apparatus for performing double deflection scanning of charged particle beams utilizes a means for introducing variations in the angle of the charged particle beam in combination with the focal or optical properties of a sector magnet. The means for introducing angular variations receives a charged particle beam and varies the angle of, i.e., deflects, the beam in a plane to define a time modulated fan beam. Once the beam angle is varied the beam is introduced to the gap between the poles of a sector electromagnet operating in a direct current mode. The focal properties of the sector electromagnet translates the time modulated fan beam into a time modulated parallel beam. The parallel beam is double deflected and may be used, for example, as the substrate impinging beam in ion implantation equipment. Multiple sector magnets may be employed for multiple end stations.

REFERENCES:
patent: 3956635 (1976-05-01), Chang
patent: 4066895 (1978-01-01), Fwanaga
patent: 4117339 (1978-09-01), Wolfe
patent: 4140913 (1979-02-01), Anger

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