Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With means to generate and to direct a reactive ion etchant...
Reexamination Certificate
2006-08-22
2006-08-22
Zervigon, Rudy (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With means to generate and to direct a reactive ion etchant...
C156S345240, C156S345330, C156S345540, C156S345550, C118S715000, C118S7230CB, C118S7230FE, C118S7230FI, C250S3960ML, C250S42300F, C250S492100, C250S493100, C250S494100
Reexamination Certificate
active
07094312
ABSTRACT:
Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis. In another embodiment, the first particle beam source is tiltable from a first position, with the first particle beam axis substantially parallel to the third axis, to a second position, with the first particle beam axis forming an angle with the third axis. Thus, the particle beam system can etch and image a vertical cross-section of the workpiece without offsetting the work stage axis from the third axis.
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Libby Charles J.
Ward Billy W.
FSI Company
Griner David
Hilgers, Bell & Richardson
Schelnberg Michael O.
Zervigon Rudy
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