Focused particle beam systems and methods using a tilt column

Details Focused particle beam systems and methods using a tilt column Focused particle beam systems and methods using a tilt column

1998-02-11

2000-03-21

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

250309, 250310, 250398, C23C 1600

Patent

active

06039000&

ABSTRACT:
Particle beam systems and methods for interacting with a workpiece according to this invention include a work stage assembly and a first particle beam source. The work stage assembly is adapted a) for supporting a workpiece, b) for translating along a first axis, c) for translating along a second axis perpendicular to the first axis, and d) for rotating about a third axis perpendicular to both the first axis and the second axis. The work stage assembly has a work stage axis substantially parallel to the third axis. The first particle beam source for interacting with the workpiece is supported by the work stage assembly. The first particle beam source has a first particle beam axis. In one embodiment, the first particle beam source is oriented so that the first particle beam axis forms an angle with the third axis. In another embodiment, the first particle beam source is tiltable from a first position, with the first particle beam axis substantially parallel to the third axis, to a second position, with the first particle beam axis forming an angle with the third axis. Thus, the particle beam system can etch and image a vertical cross-section of the workpiece without offsetting the work stage axis from the third axis.

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Esashi et. al., Laser Applications for Micromachining, AIP Conference Proceedings, vol. 369, Issue 1,pp. 1268-1273, May 1, 1996.
See the Remaining References provided in the appendix. Nonpatent references besides 1 are on request, Dec. 1998.
Skoog, D.A.; Leary, J.J.; Principles of Instrumental Analysis, 4th ed., 1992, pp. 115-118, Jan. 1992.
Sawaragi, H., et al., "Performance of a focused-ion-beam implanter with tilt-writing function," Jpn J Appl Phys Part 1, vol. 28, No. 10 (1989) pp. 2095-2098.

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