Focused ion beam system

Details Focused ion beam system Focused ion beam system

2008-04-01

2008-04-01

Berman, Jack I. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S398000, C250S492210, C250S492100

Reexamination Certificate

active

11254551

ABSTRACT:
A focused ion beam (FIB) system has an ion beam from an ion source, a condenser lens, a current-limiting aperture, an electrostatic angular aperture control lens, an electrostatic objective lens, and a controller which controls the angular aperture control lens with a polarity with which charged particles are decelerated and the objective lens with a polarity with which the charged particles are accelerated.

REFERENCES:
patent: 4457803 (1984-07-01), Takigawa
patent: 5149976 (1992-09-01), Sipma
patent: 6770887 (2004-08-01), Krivanek et al.
patent: 2003/0006377 (2003-01-01), Nomura
patent: 10-199466 (1998-07-01), None
M. Kinokuni et al., “Development of Wide Range Energy Focused Ion Beam Lithography System”,J. Vac. Sci. Technol. B 16(4), Jul./Aug. 1998, pp. 2484-2488.

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