Radiant energy – Ion generation – Field ionization type
Patent
1998-08-17
2000-10-24
Anderson, Bruce C.
Radiant energy
Ion generation
Field ionization type
250309, H01J 2700
Patent
active
061371106
ABSTRACT:
A focused ion beam having a cross section of submicron diameter, a high ion current, and a narrow energy range is generated from a target comprised of particle source material by laser ablation. The method involves directing a laser beam having a cross section of critical diameter onto the target, producing a cloud of laser ablated particles having unique characteristics, and extracting and focusing a charged particle beam from the laser ablated cloud. The method is especially suited for producing focused ion beams for semiconductor device analysis and modification.
REFERENCES:
patent: 4549082 (1985-10-01), McMillan
patent: 4629898 (1986-12-01), Orloff et al.
patent: 4639301 (1987-01-01), Doherty et al.
patent: 5015862 (1991-05-01), Holmes et al.
patent: 5019705 (1991-05-01), Compton
patent: 5126165 (1992-06-01), Akihama et al.
patent: 5148027 (1992-09-01), Umemura et al.
patent: 5196707 (1993-03-01), Gesley
patent: 5209944 (1993-05-01), Opower et al.
patent: 5272338 (1993-12-01), Winograd et al.
patent: 5290761 (1994-03-01), Keating et al.
patent: 5350920 (1994-09-01), Fukuyama et al.
patent: 5432670 (1995-07-01), Batchelder et al.
patent: 5567935 (1996-10-01), Fajardo et al.
patent: 5798529 (1998-08-01), Wagner
Lill Thorsten B.
Lykke Keith R.
Pellin Michael J.
Anderson Bruce C.
Dvorscak Mark P.
Moser William R.
Smith Bradley W.
The United States of America as represented by the United States
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