Focused ion beam processing

Details Focused ion beam processing Focused ion beam processing

1985-04-24

1987-01-27

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156643, 20419234, 204298, 250251, 250396ML, 250398, 250425, 250427, 2504923, C23C 1400

Patent

active

046393013

ABSTRACT:
An apparatus is described which makes possible the precise sputter etching and imaging of insulating and other targets, using a finely focused beam of ions produced from a liquid metal ion source. This apparatus produces and controls a submicron beam of ions to precisely sputter etch the target. A beam of electrons directed on the target neutralizes the charge created by the incident ion beam. Imaging of the target surface and ultra-precise control of the etching process is achieved by monitoring the particles that are sputtered from the target surface.

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patent: 4457803 (1984-07-01), Takigawa
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patent: 4479060 (1984-10-01), Tamura et al.
patent: 4541890 (1985-09-01), Cuomo et al.
patent: 4549082 (1985-10-01), McMillan
Harper et al., IBM Tech. Disc. Bull., 23 (1980), Oct., pp. 2143-2146.
Aisenberg et al., J. Vac. Sci. Technol., 10 (1973), pp. 104-107.

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