Focused ion beam mask maker

Details Focused ion beam mask maker Focused ion beam mask maker

1977-05-19

1978-04-18

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, 250423P, H01J 3708

Patent

active

040853306

ABSTRACT:
A method of making a pattern for a photolithographic mask. A field ion source is advantageously utilized to produce heavy ions with a high beam current density. The ions are accelerated and directly bombard a metallic coating on the mask substrate to form openings therein in the desired pattern.

REFERENCES:
patent: 2809314 (1957-10-01), Herb
patent: 3682729 (1972-08-01), Gukelberger et al.
patent: 3699334 (1972-10-01), Cohen et al.
patent: 3786359 (1974-01-01), King
patent: 3855023 (1974-12-01), Spicer et al.

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