Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1996-03-20
1997-06-10
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250309, 250396R, H01J 37317
Patent
active
056378793
ABSTRACT:
A focused ion beam column featuring a combination of blanker electrodes and a chicane system of electrodes which permit selection of a target spot size by selection of appropriate voltages applied to the chicane electrodes. The chicane potentials deflect the beam such as to select the closest distance between the center of the beam and the edge of a blocker plate thus reducing beam blurring when the beam is quickly turned off and on.
REFERENCES:
patent: 4755685 (1988-07-01), Kawanami et al.
patent: 5194739 (1993-03-01), Sato et al.
patent: 5289010 (1994-02-01), Shohet
patent: 5294794 (1994-03-01), Davies
patent: 5369279 (1994-11-01), Martin
patent: 5422490 (1995-06-01), Nakamura et al.
Berman Jack I.
Nguyen Kiet T.
Samuel Smith Robert
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