Focused ion beam column with electrically variable blanking aper

Details Focused ion beam column with electrically variable blanking aper Focused ion beam column with electrically variable blanking aper

1996-03-20

1997-06-10

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250309, 250396R, H01J 37317

Patent

active

056378793

ABSTRACT:
A focused ion beam column featuring a combination of blanker electrodes and a chicane system of electrodes which permit selection of a target spot size by selection of appropriate voltages applied to the chicane electrodes. The chicane potentials deflect the beam such as to select the closest distance between the center of the beam and the edge of a blocker plate thus reducing beam blurring when the beam is quickly turned off and on.

REFERENCES:
patent: 4755685 (1988-07-01), Kawanami et al.
patent: 5194739 (1993-03-01), Sato et al.
patent: 5289010 (1994-02-01), Shohet
patent: 5294794 (1994-03-01), Davies
patent: 5369279 (1994-11-01), Martin
patent: 5422490 (1995-06-01), Nakamura et al.

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