Radiant energy – Ion generation – Field ionization type
Reexamination Certificate
2007-02-09
2009-11-24
Berman, Jack I (Department: 2881)
Radiant energy
Ion generation
Field ionization type
C250S424000, C250S3960ML, C250S3960ML, C315S111010, C315S111210, C315S111310, C315S111410, C315S111810, C313S359100, C313S360100, C313S361100, C313S362100, C313S363100
Reexamination Certificate
active
07622721
ABSTRACT:
A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.
REFERENCES:
patent: 4122347 (1978-10-01), Kovalsky et al.
patent: 4277304 (1981-07-01), Horiike et al.
patent: 4886969 (1989-12-01), Knauer
patent: 5359258 (1994-10-01), Arkhipov et al.
patent: 5716500 (1998-02-01), Bardos et al.
patent: 5763989 (1998-06-01), Kaufman
patent: 5798602 (1998-08-01), Gopanchuk et al.
patent: 5838120 (1998-11-01), Semenkin et al.
patent: 5945781 (1999-08-01), Valentian
patent: 5973447 (1999-10-01), Mahoney et al.
patent: 6002208 (1999-12-01), Maishev et al.
patent: 6037717 (2000-03-01), Maishev et al.
patent: 6130507 (2000-10-01), Maishev et al.
patent: 6150764 (2000-11-01), Hruby et al.
patent: 6208080 (2001-03-01), King et al.
patent: 6246059 (2001-06-01), Maishev et al.
patent: 6525480 (2003-02-01), Hargus et al.
patent: 6664739 (2003-12-01), Kishinevsky et al.
patent: 6919672 (2005-07-01), Madocks
patent: 6919690 (2005-07-01), Siegfried et al.
patent: 6984942 (2006-01-01), Siegfried et al.
patent: 6987364 (2006-01-01), Petrmichl
patent: 2002/0036461 (2002-03-01), Schoenbach et al.
patent: 2005/0126487 (2005-06-01), Tabuchi et al.
patent: 2006/0205190 (2006-09-01), Chi et al.
patent: 2008/0073557 (2008-03-01), German et al.
H.R. Kaufman et al., “End-Hall Ion Source”, Jul./Aug. 1987, pp. 2081-2084.
Advanced Energy Industries, Inc., “Round and Linear Ion Beam Sources”, 2000.
A. Shabalin Whitepaper: Industrial Ion Sources and Their Application for DLC Coating, SVC 42nd Annual Technical Conference, Jan. 2001, pp. 1-4, Fort Collins, CO.
J. E. Keem “High Current Density Anode Layer Ion Sources”44th Annual Techn. Conf. Soc. Vacuum Coaters. Philadelphia, PA: SVC, 2001, 388-393.
A. Anders “Plasma and Ion Sources in Large Area Coatings” Review Lawrence Berkeley National Laboratory (University of California) 2005 pp. 1-11.
H.R. Kaufman et al., “End-Hall Ion Source”, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films Jul./Aug. 1987 vol. 5, Issue 4, pp. 2081-2084.
Bizyukov Alexander
Bizyukov Ivan
Gutkin Michael
Sereda Konstantin
Sleptsov Vladimir
Berman Jack I
Gutkin Michael
Ippolito Rausch Nicole
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