Focus test mask, focus measurement method and exposure...

Details Focus test mask, focus measurement method and exposure... Focus test mask, focus measurement method and exposure...

2005-12-28

2008-09-16

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C430S030000

Reexamination Certificate

active

07426017

ABSTRACT:
This focus test mask is provided with a test pattern that is projected onto a wafer via a projection optical system. This test pattern includes: a plurality of line patterns that are lined up in a direction of measurement; phase shift sections that are provided in areas adjacent to each of the plurality of line patterns and that are used to shift the phase of light passing through; and reference patterns that are used to obtain an image that forms a reference when the shift in the line pattern image is measured. Spaces between the plurality of line patterns are set at a size that allows each line pattern to be regarded as equivalent to being isolated lines.

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