Focus sensitive lithographic apparatus, systems, and methods

Details Focus sensitive lithographic apparatus, systems, and methods Focus sensitive lithographic apparatus, systems, and methods

2011-01-04

2011-01-04

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C355S059000, C430S005000, C430S322000

Reexamination Certificate

active

07864294

ABSTRACT:
A system includes an illuminator, a mask, and a measurement device. The illuminator includes a light source. The mask includes at least one focus determination pattern having a first pattern portion and an adjacent second pattern portion. The first pattern portion and the second pattern portion have substantially the same width but produce a phase difference in light transmitted through the pattern portions. The measurement device measures a first critical dimension and a second critical dimension of a feature produced on a target by the at least one focus determination pattern. The difference between the first critical dimension and the second critical dimension relates to an amount of defocus and is sensitive to the focus change. The system may also include a feedback control loop where a determination regarding an amount of defocus is used to focus the position of a wafer or a mask or both of them onto the target. Additional apparatus, systems, and methods are disclosed.

REFERENCES:
patent: 5300786 (1994-04-01), Brunner et al.
patent: 6479194 (2002-11-01), Talor, Jr.
patent: 2003/0219655 (2003-11-01), Sutani et al.
patent: 2005/0208391 (2005-09-01), Mieher et al.
patent: 2005/0247669 (2005-11-01), Wang et al.

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