Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1997-08-28
1999-10-12
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
G03F 900
Patent
active
059653094
ABSTRACT:
Focus and exposure parameters may be controlled in a lithographic process for manufacturing microelectronics by creating a complementary tone pattern of shapes and spaces in a resist film on a substrate. Corresponding dimensions of the resist shape and space are measured and the adequacy of focus or exposure dose are determined as a function of the measured dimensions. Etching parameters may also be controlled by creating a complementary tone pattern of etched shapes and spaces on a substrate. Corresponding dimensions of the etched shape and space are measured and the adequacy of etching parameters are determined as a function of the measured dimensions.
REFERENCES:
patent: 3689162 (1972-09-01), Ferguson
patent: 4529314 (1985-07-01), Ports
patent: 4555798 (1985-11-01), Broadbent, Jr. et al.
patent: 4568189 (1986-02-01), Bass et al.
patent: 4596037 (1986-06-01), Bouchard et al.
patent: 4659936 (1987-04-01), Kikkawa et al.
patent: 4783826 (1988-11-01), Koso
patent: 4820055 (1989-04-01), Muller
patent: 4853967 (1989-08-01), Mandeville
patent: 4893346 (1990-01-01), Bishop
patent: 4908656 (1990-03-01), Suwa et al.
patent: 4908871 (1990-03-01), Hara et al.
patent: 4981372 (1991-01-01), Morimoto et al.
patent: 5103104 (1992-04-01), Tissier et al.
patent: 5119436 (1992-06-01), Holdgrafer
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5262258 (1993-11-01), Yanagisawa
patent: 5272763 (1993-12-01), Maruyama et al.
patent: 5309198 (1994-05-01), Nakagawa
patent: 5386294 (1995-01-01), Ototake et al.
patent: 5402224 (1995-03-01), Hirukawa et al.
patent: 5418613 (1995-05-01), Matsutani
patent: 5483345 (1996-01-01), Donaher et al.
patent: 5629772 (1997-05-01), Ausschnitt
Electrical Measurement for Characterizing Lithography, VLSI Electronics Microstructure Science, by Christopher P. Ausschnitt, vol. 16, pp. 320-356, 1987.
Ausschnitt Christopher P.
Brunner Timothy A.
Lagus Mark E.
International Business Machines - Corporation
Peterson Peter W.
Townsend Tiffany
Young Christopher G.
LandOfFree
Focus or exposure dose parameter control system using tone rever does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Focus or exposure dose parameter control system using tone rever, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Focus or exposure dose parameter control system using tone rever will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-650624