Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2009-01-23
2010-11-23
Young, Christopher G (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S296000, C430S942000, C382S145000, C382S149000
Reexamination Certificate
active
07838185
ABSTRACT:
In a focus measurement method and a method of manufacturing a semiconductor device relating to the present invention, a focus value is obtained by using a fluctuation where shrinkage of a resist pattern by an electron beam irradiation depends upon the focus value. In the case of obtaining the focus value, the shrinkage of the resist pattern for a focus measurement formed by exposure to be subject for a focus value measurement is measured. The focus value corresponding to the shrinkage is obtained from the pre-obtained focal dependency of the shrinkage. A focal shift length can be defined from a difference between the focus value and a predetermined best focus value.
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Asahi Kenichi
Fukumoto Hirofumi
Ide Rimiko
Noda Kenji
Ujimaru Naohiko
McDermott Will & Emery LLP
Panasonic Corporation
Young Christopher G
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