Focus determination for laser-mask imaging systems

Details Focus determination for laser-mask imaging systems Focus determination for laser-mask imaging systems

2007-06-29

2010-02-09

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Of light reflection

C356S498000, C356S624000, C355S055000, C355S056000, C355S067000

Reexamination Certificate

active

07659989

ABSTRACT:
A system and method for calibrating the focal position of the imaging plane of a sequential lateral solidification (SLS) system. A test pattern is formed on a test substrate while varying the z-position of the focal position. Information concerning the z-position of the focal position is stored by a data processing system for various positions in the test pattern. An inspection light beam is directed onto the test pattern at a predetermined angle. The reflection of the inspection light beam is detected by an optical detector. The data processing system analyzes the reflection and determines whether the reflected light is substantially specular or substantially scattered. The data processing system uses the analysis of the reflected light and the information concerning the z-position of the focal position to select an optimal focal position for calibrating the SLS system.

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