Focus blur measurement and control method

Details Focus blur measurement and control method Focus blur measurement and control method

2005-08-18

2008-10-21

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S396000

Reexamination Certificate

active

07439001

ABSTRACT:
A method for optimizing imaging and process parameter settings in a lithographic pattern imaging and processing system is disclosed. The method includes correlating the dimensions of a first set of at least one control pattern printed in a lithographic resist layer, measured at three or more locations on or within the pattern which correspond to differing dose, defocus and blur sensitivity. The method then includes measuring the dimensions on subsequent sets of control patterns, printed in a lithographic resist layer, at three or more locations on or within each pattern, of which a minimum of three locations match those measured in the first set, and determining the effective dose, defocus and blur values associated with forming the subsequent sets of control patterns by comparing the dimensions at the matching locations with the correlated dependencies. A method for determining blur, focus and exposure dose error in lithographic imaging is also disclosed.

REFERENCES:
patent: 4166219 (1979-08-01), Ausschnitt et al.
patent: 4290384 (1981-09-01), Ausschnitt et al.
patent: 4437760 (1984-03-01), Ausschnitt
patent: 4538105 (1985-08-01), Ausschnitt
patent: 4568189 (1986-02-01), Bass et al.
patent: 4890239 (1989-12-01), Ausschnitt et al.
patent: 4898911 (1990-02-01), Miyashita et al.
patent: 5343292 (1994-08-01), Brueck et al.
patent: 5545593 (1996-08-01), Watkins et al.
patent: 5629772 (1997-05-01), Ausschnitt
patent: 5712707 (1998-01-01), Ausschnitt et al.
patent: 5731877 (1998-03-01), Ausschnitt
patent: 5756242 (1998-05-01), Koizumi et al.
patent: 5757507 (1998-05-01), Ausschnitt et al.
patent: 5776645 (1998-07-01), Barr et al.
patent: 5790254 (1998-08-01), Ausschnitt
patent: 5805290 (1998-09-01), Ausschnitt et al.
patent: 5877861 (1999-03-01), Ausschnitt et al.
patent: 5914784 (1999-06-01), Ausschnitt et al.
patent: 5928822 (1999-07-01), Rhyu
patent: 5949547 (1999-09-01), Tseng et al.
patent: 5952134 (1999-09-01), Hwang
patent: 5953128 (1999-09-01), Ausschnitt et al.
patent: 5965309 (1999-10-01), Ausschnitt et al.
patent: 5968693 (1999-10-01), Adams
patent: 5976740 (1999-11-01), Ausschnitt et al.
patent: 5981119 (1999-11-01), Adams
patent: 5985495 (1999-11-01), Okumura et al.
patent: 6003223 (1999-12-01), Hagen et al.
patent: 6004706 (1999-12-01), Ausschnitt et al.
patent: 6020966 (2000-02-01), Ausschnitt et al.
patent: 6027842 (2000-02-01), Ausschnitt et al.
patent: 6042976 (2000-03-01), Chiang et al.
patent: 6061119 (2000-05-01), Ota
patent: 6128089 (2000-10-01), Ausschnitt et al.
patent: 6130750 (2000-10-01), Ausschnitt et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 6183919 (2001-02-01), Ausschnitt et al.
patent: 6317211 (2001-11-01), Ausschnitt et al.
patent: 6335151 (2002-01-01), Ausschnitt et al.
patent: 6346979 (2002-02-01), Ausschnitt et al.
patent: 6350548 (2002-02-01), Leidy et al.
patent: 6429667 (2002-08-01), Ausschnitt et al.
patent: 6457169 (2002-09-01), Ross
patent: 6460265 (2002-10-01), Pogge et al.
patent: 6471929 (2002-10-01), Kusunoki et al.
patent: 6612159 (2003-09-01), Knutrud
patent: 6638671 (2003-10-01), Ausschnitt et al.
patent: 6766211 (2004-07-01), Ausschnitt
patent: 6803995 (2004-10-01), Ausschnitt
patent: 6842237 (2005-01-01), Ausschnitt et al.
patent: 6869739 (2005-03-01), Ausschnitt et al.
patent: 6879400 (2005-04-01), Ausschnitt et al.
patent: 2001/0001900 (2001-05-01), Pogge et al.
patent: 2002/0097399 (2002-07-01), Ausschnitt et al.
patent: 2003/0053057 (2003-03-01), Mishima
patent: 2003/0071997 (2003-04-01), Ausschnitt et al.
patent: 2003/0077527 (2003-04-01), Ausschnitt et al.
patent: 2003/0123052 (2003-07-01), Ausschnitt et al.
patent: 61-168227 (1986-07-01), None
patent: 61-170032 (1986-07-01), None
patent: 2-260441 (1990-10-01), None
patent: 10-213895 (1998-08-01), None
patent: WO02/19415 (2002-03-01), None
Starikov, Alexander; “Exposure Monitor Structure”, SPIE vol. 1261, Integrated Circuit Metrology, Inspection and Process Control IV, 1990, pp. 315-324.
“Method for Measuring Semiconductor Lithographic Tool Focus and Exposure” IBM Technical Disclosure Bulletin, Jul. 1987, pp. 516-518.

Affiliated with

Also associated with

Rating

Focus blur measurement and control method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Focus blur measurement and control method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Focus blur measurement and control method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3999518