Focus adjustment in an alignment and exposure apparatus

Details Focus adjustment in an alignment and exposure apparatus Focus adjustment in an alignment and exposure apparatus

1984-07-12

1986-07-22

Haroian, Harry N.

Optics: image projectors

Miscellaneous

353121, 353101, 353 28, 33180R, G03B 2734

Patent

active

046015604

ABSTRACT:
An alignment and exposure apparatus including a mask chuck for holding a mask, a wafer chuck for holding a wafer, a projection optical system for projecting the image of the mask onto the wafer, a non-contact distance measuring gauge for measuring the distance from a reference position to the wafer without contacting the wafer, a processing unit for calculating, on the basis of the measured distance, data on the position within the depth of field of the projection optical system and to be assumed by the mask, and an adjusting unit for adjusting the position of the mask in the direction of optical axis in accordance with an output from the processing unit so as to meet the data calculated by the processing unit, whereby the mask pattern is correctly focused on the wafer in the non-contact process with respect to the wafer surface.

REFERENCES:
patent: 4118869 (1978-10-01), Hartung
patent: 4344160 (1982-08-01), Gabriel et al.
patent: 4420233 (1983-12-01), Nomoto et al.
patent: 4431304 (1984-02-01), Mayer
patent: 4444492 (1984-04-01), Lee

Affiliated with

Also associated with

Rating

Focus adjustment in an alignment and exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Focus adjustment in an alignment and exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Focus adjustment in an alignment and exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-862720