Focal plane phase-shifting lithography

Details Focal plane phase-shifting lithography Focal plane phase-shifting lithography

1996-05-14

1997-07-22

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

G21K 504

Patent

active

056506325

ABSTRACT:
A lithographic system for patterned exposure of radiation-sensitive resist. The system comprises a radiation source, a mask, a converging optical element having a focal plane, and a phase-shifting optical element disposed at the focal plane of the converging optical element. The lithographic system produces enhanced images.

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