Flux washing agent

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Patent

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Details

510433, 510504, 510505, C11D 162

Patent

active

056935994

ABSTRACT:
A flux washing agent which comprises an aqueous solution containing a quaternary ammonium salt and hydrazine is disclosed. The flux washing agent is used in the production of printed circuit boards and the like. The flux washing agent has a washing ability, and a property to suppress etching of solder which are comparable with those of Flon 113 and trichloroethylene heretofore used as flux washing agents. Furthermore, the flux washing agent is safe, does not cause environmental pollution and has an excellent rinsing property.

REFERENCES:
patent: 4873122 (1989-10-01), Darken
patent: 5175078 (1992-12-01), Aoyama et al.

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