Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1996-04-01
1997-12-02
Lieberman, Paul
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510433, 510504, 510505, C11D 162
Patent
active
056935994
ABSTRACT:
A flux washing agent which comprises an aqueous solution containing a quaternary ammonium salt and hydrazine is disclosed. The flux washing agent is used in the production of printed circuit boards and the like. The flux washing agent has a washing ability, and a property to suppress etching of solder which are comparable with those of Flon 113 and trichloroethylene heretofore used as flux washing agents. Furthermore, the flux washing agent is safe, does not cause environmental pollution and has an excellent rinsing property.
REFERENCES:
patent: 4873122 (1989-10-01), Darken
patent: 5175078 (1992-12-01), Aoyama et al.
Aoyama Tetsuo
Kobayashi Toshihiko
Kondoh Toshio
Tsuyuki Kaoru
Hardee John R.
Lieberman Paul
Mitsubishi Gas Chemical Company Inc.
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