Fluoropolymer and resist composition

Details Fluoropolymer and resist composition Fluoropolymer and resist composition

2006-08-15

2006-08-15

Wu, David W. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S249000, C427S553000, C427S555000

Reexamination Certificate

active

07091294

ABSTRACT:
A fluoropolymer (A) having units derived from monomer units formed by cyclopolymerization of at least one fluorinated diene selected from a fluorinated diene represented by the formula (1) and a fluorinated diene represented by the formula (2), and units derived from monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (3):in-line-formulae description="In-line Formulae" end="lead"?CF2═CFCF2—C(CF3)(OR1)—CH2CH═CH2  (1)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?CF2═CFCH2—CH((CH2)nC(CF3)2(OR1))—CH2CH═CH2  (2)in-line-formulae description="In-line Formulae" end="tail"?in-line-formulae description="In-line Formulae" end="lead"?CF2═CFCH2—CH(COOR2)—CH2CH═CH2  (3)in-line-formulae description="In-line Formulae" end="tail"?wherein R1represents a hydrogen atom, a blocked group of a hydroxyl group capable of being converted into a hydrogen atom by an acid, or a blocked carboxyl group-containing organic group capable of being converted into a carboxyl group-containing organic group by an acid, R2represents a hydrocarbon group having at most 20 carbon atoms, and n represents 0 or 1.

REFERENCES:
patent: 6468712 (2002-10-01), Fedynyshyn
patent: 6737215 (2004-05-01), Dammel et al.
patent: 6818258 (2004-11-01), Kaneko et al.
patent: 2005/0234206 (2005-10-01), Takebe et al.
patent: WO 00/17712 (2000-03-01), None
patent: WO 01/63362 (2001-08-01), None
Yoko Takebe, et al., “A New Monocyclic Fluoropolymer structure for 157-nm Photoresists”, Proceedings of SPIE, vol. 5376, (2004), pp. 151-158.
U.S. Appl. No. 11/353,149, filed Feb. 14, 2006, Takebe et al.

Affiliated with

Also associated with

Rating

Fluoropolymer and resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluoropolymer and resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluoropolymer and resist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3609287