Fluorocarbon-organosilicon copolymers and coatings prepared...

Stock material or miscellaneous articles – Composite – Of silicon containing

Reexamination Certificate

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C427S588000, C427S592000, C427S249300, C427S255290, C427S255600, C427S255700, C428S421000, C428S500000, C428S377000, C428S373000, C428S374000

Reexamination Certificate

active

06887578

ABSTRACT:
Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state29Si,19F, and13C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF2groups as repeat units.

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International Search Report Completed on Mar. 2, 2003 and Mailed on Mar. 18, 2003.

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