Fluorobutene derivatives and process for producing same

Organic compounds -- part of the class 532-570 series – Organic compounds – Halogen containing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

11506963

ABSTRACT:
The present invention provides novel compounds 2,4,4,4-tetrafluoro-1-butene and (E)- and (Z)-1,1,1,3-tetrafluoro-2-butenes. Furthermore, the present invention provides the following novel first and second processes for producing 2,4,4,4-tetrafluoro-1-butene and (E)- and (Z)-1,1,1,3-tetrafluoro-2-butenes. The first process is a process for producing 2,4,4,4-tetrafluoro-1-butene by heating 1,1,1,3,3-pentafluorobutane at from about 200° C. to about 700° C. The second process is a process for producing (E)- and (Z)-1,1,1,3-tetrafluoro-2-butenes by bringing 1,1,1,3,3-pentafluorobutane with a base. By the first and second processes, it is possible to obtain respective target fluorobutenes with high selectivity.

REFERENCES:
patent: 2480560 (1949-08-01), Downing et al.
patent: 2599631 (1952-06-01), Harmon et al.
patent: 2750431 (1956-06-01), Tarrant et al.
patent: WO 2004/058827 (2004-07-01), None
Haszeldine et al., addition of free radicals to unsaturated systems, (Journal of Chemical Society (1954) 2040-2042.
Anderson et al., Diels-Alder reaction, (Journal of Chemical [section] C: (1969), (2), 211-217.
European Search Report dated Aug. 31, 2006 (three (3) pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluorobutene derivatives and process for producing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluorobutene derivatives and process for producing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorobutene derivatives and process for producing same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3893513

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.