Fluorine-containing monomeric ester compound for base resin...

Details Fluorine-containing monomeric ester compound for base resin... Fluorine-containing monomeric ester compound for base resin...

2005-01-25

2005-01-25

Zucker, Paul A. (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Carboxylic acid esters

C560S219000

Reexamination Certificate

active

06846949

ABSTRACT:
The invention discloses a novel ester compound of an unsaturated carboxylic acid represented by the general formulain which R1is preferably a hydrogen atom or methyl group, R2is preferably a trifluoromethyl group, R3is a non-aromatic polycyclic hydrocarbon group or, preferably, an adamantyl group and R4is preferably a hydrogen atom or methyl group. This unsaturated ester compound is polymerizable to give a (co)polymeric resin which can be used as a base resinous ingredient in a photoresist composition for light exposure with ultraviolet light of a very short wavelength by virtue of the high transparency to the short-wavelength light. A synthetic method for the preparation of the novel ester compound is disclosed.

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Ogata et al,Proceedings of SPIE-The International Society for Optical Engineering, New Polymer for 157-nm Single-Layer Resist Based on Fluorine Containing Acryl Copolymer, 2001, 4345(Pt. 2, Advances in Resist Technology and Processing XVIII),pp 1048-1055.*
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