Fluorine-containing cyclic compounds, fluorine-containing...

Details Fluorine-containing cyclic compounds, fluorine-containing... Fluorine-containing cyclic compounds, fluorine-containing...

2005-02-22

2005-02-22

Shippen, Michael L. (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Oxygen containing

C430S270100, C430S322000, C430S326000, C430S907000, C526S245000, C526S247000, C560S220000, C568S667000, C568S669000

Reexamination Certificate

active

06858760

ABSTRACT:
A fluorine-containing cyclic compound is represented by the formula 1:wherein each of R1, R2and R3independently represents a hydrogen, alkyl group, fluorine, fluoroalkyl group or hexafluorocarbinol group,wherein at least one of the hexafluorocarbinol groups may partly or totally be protected with a protecting group, andwherein the protecting group is (a) a straight-chain, branched or cyclic hydrocarbon group having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group and optionally contains a fluorine atom, oxygen atom, nitrogen atom or carbonyl bond.

REFERENCES:
patent: 6794110 (2004-09-01), Breyta et al.
patent: 20040053161 (2004-03-01), Kanna et al
patent: 20040091813 (2004-05-01), Poss et al.
patent: 20040175645 (2004-09-01), Sasaki et al.
Theodore H. Fedynshyn et al., “Fluoroaromatic Resists for 157-nm Lithography”, Journal of Photopolymer Science and Technology, 2002, pp. 655-666, vol. 15, No. 4.
Ralph R. Dammel et al., “New Resin Systems for 157 nm Lithography”, Journal of Photopolymer Science and Technology, 2001, pp. 603-612, vol. 14, No. 4.

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