Fluorine-containing compounds, fluorine-containing...

Details Fluorine-containing compounds, fluorine-containing... Fluorine-containing compounds, fluorine-containing...

2007-10-16

2007-10-16

Wu, David W. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S081000, C526S245000, C526S246000, C526S247000

Reexamination Certificate

active

10753071

ABSTRACT:
The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1:where R1is (a) a straight-chain alkylene group, (b) a branched alkylene group, (c) a cyclic structure containing an aromatic ring group or aliphatic cyclic group, or (d) a substituent containing an aromatic ring group and an aliphatic cyclic group, and R1optionally contains fluorine, another halogen, CN, oxygen, nitrogen, silicon, or alcohol, andR2is a hydrogen atom, a straight-chain or branched alkyl group, an aromatic group, or a hydrocarbon group optionally containing an aliphatic cyclic group, and R2optionally contains fluorine, oxygen, nitrogen, carbonyl bond, or alcohol, and a plural number of R2having different structures are optionally contained in the molecule.

REFERENCES:
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patent: 6013752 (2000-01-01), Mowrer et al.
patent: 2002/0028886 (2002-03-01), Abe et al.
patent: 2003/0232940 (2003-12-01), Komoriya et al.
patent: 180913 (1986-05-01), None
patent: WO88/09799 (1988-12-01), None
Theodore. H. Fedynshyn, et al., “Fluoroaromatic Resists for 157-nm Lithography”, Journal of Polymer Science and Technology, 2002, pp. 655-666, vol. 15, No. 4, Lexington, MA.
Ralph R. Dammel et al., “New Resin Systems for 157 nm Lithography”, Journal of Polymer Science and Technology, 2001, pp. 603-612, vol. 14, No. 4.

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