Fluorine-containing allyl ether compounds, their copolymers,...

Details Fluorine-containing allyl ether compounds, their copolymers,... Fluorine-containing allyl ether compounds, their copolymers,...

2006-07-25

2008-07-15

Keys, Rosalynd (Department: 1621)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S242000, C526S245000, C526S247000, C430S270100, C430S322000, C430S326000, C430S330000, C430S907000

Reexamination Certificate

active

07399815

ABSTRACT:
The invention relates to a fluorine-containing allyl ether compound represented by the formula 1,wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.

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Kamon et al., “Newly Developed Acrylic Copolymers for ArF Photoresist,”Journal of Photopolymer Science and Technology, vol. 18, No. 4 (2002), pp. 535-540.

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