Fluorine-containing allyl ether compounds, their copolymers,...

Details Fluorine-containing allyl ether compounds, their copolymers,... Fluorine-containing allyl ether compounds, their copolymers,...

2006-09-19

2006-09-19

Keys, Rosalynd (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Oxygen containing

C568S665000, C568S669000, C568S670000, C560S125000, C560S256000, C562S502000, C562S507000, C562S510000

Reexamination Certificate

active

07109383

ABSTRACT:
The invention relates to a fluorine-containing allyl ether compound represented by the formula 1,wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further relates to a fluorine-containing copolymer containing a first unit derived from the fluorine-containing allyl ether represented by the formula 1; and a second unit derived from a vinyl monomer.

REFERENCES:
patent: 6217953 (2001-04-01), Heckmeier et al.
patent: 2004/0106755 (2004-06-01), Sumida et al.
patent: 19945890 (2000-04-01), None
patent: WO 2003061698 (2003-07-01), None
Michel et al., Odor-structure relationships using fluorine as a probe, Apr. 2000, Tetrahedron, vol. 56, No. 25, pp. 4253-4260.
Itoh et al., Synthesis of optically active partly gem-difluorinated allylic alcohols via [2,3]-Wittig rearrangement and lipase-catalyzed reaction, Apr. 2000, Tetrahedron Letters, vol. 41, No. 23, pp. 4591-4595.
Kamon, et al., “Newly Developed Acrylic Copolymers for ArF Photoresist”,Journal of Photopolymer Science and Technology, vol. 15, No. 4 (2002), pp. 535-540.

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