Fluorine assisted stripping and residue removal in sapphire down

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

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Details

134 12, 438725, 118723R, B08B 600, C25F 330

Patent

active

060823747

ABSTRACT:
A method for removing material from a substrate. A plasma is generated in a plasma generating and discharge device including a sapphire plasma tube. At least one fluorine-containing compound is introduced into the plasma. A forming gas is introduced into the plasma. The plasma is directed toward the material to be removed from the substrate.

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