Fluorination of amorphous thin-film materials with xenon fluorid

Details Fluorination of amorphous thin-film materials with xenon fluorid Fluorination of amorphous thin-film materials with xenon fluorid

1987-05-01

1988-08-02

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

4272551, B05D 306, C23C 1600

Patent

active

047613025

ABSTRACT:
A method is disclosed for producing fluorine-containing amorphous semiconductor material, preferably comprising amorphous silicon. The method includes depositing amorphous thin-film material onto a substrate while introducing xenon fluoride during the film deposition process.

REFERENCES:
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4452828 (1984-06-01), Namba et al.
patent: 4485121 (1984-11-01), Matsummura
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4544423 (1985-06-01), Tsuge et al.
patent: 4608097 (1986-08-01), Weinberger et al.
patent: 4637938 (1987-01-01), Lee et al.

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