Fluorinated surfactants in overcoat compositions and...

Details Fluorinated surfactants in overcoat compositions and... Fluorinated surfactants in overcoat compositions and...

2005-04-05

2005-04-05

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

C430S527000, C430S528000, C430S529000, C430S635000, C430S636000, C106S154300, C106S154400, C106S170200, C106S170260, C106S170460, C106S205600, C252S500000, C516S200000, C516S203000

Reexamination Certificate

active

06875563

ABSTRACT:
A coating composition for use in forming an overcoat layer in a photographic element, said composition comprising an aqueous solution of: a mixture of two or more surfactants; a hydrophilic binder; matte beads; and a lubricating agent; wherein one of the surfactants is represented by the following Formula (I) and is the only fluorosurfactant in the composition:in-line-formulae description="In-line Formulae" end="lead"?Rf—CH2CH2—S-(A)-D  (I)in-line-formulae description="In-line Formulae" end="tail"?where Rfis —(CF2)nCF3, n represents the number of CF2groups and is 3 or 5 in at least 60% of the Rfgroups present, and in the remainder of Rfgroups n is 7, 9, or 11.A is a divalent linking group that includes substituted alkylene or alkylene (N-alkylene)amide; andD is an ionic group.A photographic element with an outermost layer containing the coating composition is also disclosed.

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US 5,837,440, 11/1998, Gerlach et al. (withdrawn)
Research Disclosure No. 10147, Sep. 1972.

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