Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-10-03
2010-10-12
Webb, Gregory E (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C134S001300
Reexamination Certificate
active
07811978
ABSTRACT:
Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
REFERENCES:
patent: 2803615 (1957-08-01), Ahlbrecht
patent: 2803656 (1957-08-01), Ahlbrecht
patent: 2809990 (1957-10-01), Brown
patent: 3734962 (1973-05-01), Niederpüm
patent: 4370254 (1983-01-01), Mitschke et al.
patent: 5466389 (1995-11-01), Ilardi et al.
patent: 5624541 (1997-04-01), Pohmer et al.
patent: 5688884 (1997-11-01), Baker et al.
patent: 6376452 (2002-04-01), Flynn et al.
patent: 6664354 (2003-12-01), Savu et al.
patent: 6753380 (2004-06-01), Qiu
patent: 6858124 (2005-02-01), Zazzera et al.
patent: 6890452 (2005-05-01), Parent et al.
patent: 7101492 (2006-09-01), Parent et al.
patent: 7169323 (2007-01-01), Parent et al.
patent: 2004/0089840 (2004-05-01), Parent et al.
patent: 2004/0094510 (2004-05-01), Parent et al.
patent: 2005/0197273 (2005-09-01), Savu et al.
patent: 0073863 (1983-03-01), None
patent: 0416126 (1991-03-01), None
patent: 0561236 (1993-09-01), None
patent: 1599414 (1981-09-01), None
patent: 5275406 (1993-10-01), None
patent: WO 2004044092 (2004-05-01), None
Fluorinated Surfactants, ed Erik Kissa, Marcel Dekker, Inc. New York, 1994, p. 119.
L.A. Zazzera and J.F. Moulder,J. Electrochem. Soc., 136, No. 2, 484 (1989).
Kikuyama, et al., IEEE Transactions on Semiconductor Manufacturing, vol. 3, No. 3, Aug. 1990, Surface Active Buffered Hydrogen Fluoride Having Excellent Wettability for ULSI Processing, pp. 99-108.
Lamanna William M.
Parent Michael J.
Savu Patricia M.
3M Innovative Properties Company
Kokko Kent S.
Webb Gregory E
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