Stock material or miscellaneous articles – Composite – Of inorganic material
Patent
1992-12-29
1995-10-31
Turner, A. A.
Stock material or miscellaneous articles
Composite
Of inorganic material
428698, 428702, 10628711, H01L 21318
Patent
active
054628121
ABSTRACT:
A plasma enhanced chemical vapor deposition process for producing a fluorinated silicon nitride film on a substrate is disclosed. The process utilizes a mixture of silane, perfluorosilane and nitrogen to produce films of high conformality and stability. The silane and perfluorosilane in the mixture are in a ratio of 0.05 to 1 on a volume basis. The preferred silane is SiH.sub.4 and the preferred perfluorosilane is SiF.sub.4. Films prepared by the process are disclosed and their properties are described.
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Dobuzinsky David M.
Dopp Douglas J.
Harmon David L.
Nguyen Son V.
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