Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Reexamination Certificate
2007-12-25
2007-12-25
Wu, David W. (Department: 1713)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
C526S247000, C526S249000, C526S250000, C526S255000, C428S014000, C430S270100, C430S315000
Reexamination Certificate
active
10523490
ABSTRACT:
This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have high transparency at short wavelengths such as 193 nm and 157 nm, and provide good plasma etch resistance and adhesive properties. Also provided are photoresist compositions and substrates coated therewith.
REFERENCES:
patent: 5229473 (1993-07-01), Kobo et al.
patent: 6593058 (2003-07-01), Feiring et al.
patent: 2003/0215735 (2003-11-01), Wheland et al.
patent: 1246013 (2002-10-01), None
patent: WO 0067072 (2000-11-01), None
patent: WO-2004/016664 (2004-02-01), None
Reichmanis et. al., “The Effect of Substituents on the Photosensitivity of 2-Nitrobenzyl Ester Deep UV Resists”, J. Electrochem. Soc., vol. 130, 1433-1437, 1983.
Posner et. al., A Mechanistic and Synthetic Study of Organocopper Substitution Reactions With Some Homoallylic and Cyclopropylcarbinyl Substrates, Tetrahedron, vol. 32, 2281-2287, 1976.
Gallagher et. al., Electrophile-Mediated Cyclisations Involving the Allene System, Stereoselectivity and Synthetic Utility of PD-Catalysed Heteroatom Cyclisation Reactions. X-Ray Molecular Structure of Methyl 2-Trans-3-Phenyl-N-(P-Tolylsulfonyl) Pyrrolidin-2-Yi Acrylate, J. Chem. Soc. Perkin Trans 1, 1992, pp. 433-440.
Farnham William Brown
Feiring Andrew Edward
Feldman Jerald
Schadt, III Frank L.
E.I. du Pont de Nemours and Company
Hu Henry S.
Wu David W.
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