Gas separation – Means within gas stream for conducting concentrate to collector
Patent
1985-12-13
1987-04-14
Spitzer, Robert
Gas separation
Means within gas stream for conducting concentrate to collector
55 68, 55158, 4272481, 428442, B01D 5322
Patent
active
046575642
ABSTRACT:
The present invention is a treated, semi-permeable, polymeric membrane having improved selectivity for separating components of a gas mixture. The membrane is provided by fluorinating a polymer cast into membrane form, having the general structural formula: ##STR1## wherein R.sub.1 is a linear or branched C.sub.1 -C.sub.4 alkyl group; R.sub.2 and R.sub.3 are independently linear or branched C.sub.1 -C.sub.6 alkyl groups; R.sub.4 is a linear or branched C.sub.1 -C.sub.12 alkyl or aryl group; X is a C.sub.1 -C.sub.3 alkyl group or ##STR2## m is at least 100; and n is 0 or 1.
REFERENCES:
patent: 3770567 (1973-11-01), Grot
patent: 3902947 (1975-09-01), Grot
patent: 3988491 (1976-10-01), Dixon et al.
patent: 4020223 (1977-04-01), Dixon et al.
patent: 4081574 (1978-03-01), Hawkins et al.
patent: 4144374 (1979-03-01), Lagow et al.
patent: 4268279 (1981-05-01), Shindo et al.
patent: 4393113 (1983-07-01), Sugie et al.
patent: 4414693 (1983-11-01), Brody
patent: 4472175 (1984-09-01), Malon et al.
patent: 4486202 (1984-12-01), Malon et al.
S. S. Kulkarni et al., "Membrane Separation Processes for Acid Gases", No. 229, vol. 79, AIChE Symposium Series, Tutorial Lectures in Electrochemical Eng. and Tech.-II, pp. 172-178.
Air Products and Chemicals Inc.
Innis E. Eugene
Rodgers Mark L.
Simmons James C.
Spitzer Robert
LandOfFree
Fluorinated polymeric membranes for gas separation processes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fluorinated polymeric membranes for gas separation processes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorinated polymeric membranes for gas separation processes will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1782958