Fluorinated polymer, negative photosensitive resin...

Details Fluorinated polymer, negative photosensitive resin... Fluorinated polymer, negative photosensitive resin...

2011-07-05

2011-07-05

Chu, John S (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

C430S287100, C430S905000, C525S326200, C525S374000

Reexamination Certificate

active

07972754

ABSTRACT:
To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition.A fluorinated polymer which is a copolymer made of at least two monomers each having an ethylenic double bond, and which has a side chain having a C20or lower alkyl group in which at least one of its hydrogen atoms is substituted by a fluorine atom (provided that the alkyl group may contain an etheric oxygen atom between carbon atoms) and a side chain having at least two ethylenic double bonds per side chain.

REFERENCES:
patent: 6689539 (2004-02-01), Kamiya et al.
patent: 7232648 (2007-06-01), Takahashi et al.
patent: 7267929 (2007-09-01), Takahashi et al.
patent: 7579066 (2009-08-01), Nozawa et al.
patent: 2005/0191580 (2005-09-01), Takahashi et al.
patent: 101313249 (2008-11-01), None
patent: 63-154714 (1988-06-01), None
patent: 4-345609 (1992-12-01), None
patent: 6-230212 (1994-08-01), None
patent: 2001-312053 (2001-11-01), None
patent: 2004-151618 (2004-05-01), None
patent: 2005-60515 (2005-03-01), None
patent: 2005-139363 (2005-06-01), None
patent: 2005-315984 (2005-11-01), None
patent: WO 2004/042474 (2004-05-01), None
U.S. Appl. No. 12/127,993, filed May 28, 2008, Ishizeki, et al.
U.S. Appl. No. 12/578,625, filed Oct. 14, 2009, Ishizeki, et al.
U.S. Appl. No. 12/627,099, filed Nov. 30, 2009, Takahashi, et al.
U.S. Appl. No. 12/627,727, filed Nov. 30, 2009, Ishizeki, et al.

Affiliated with

Also associated with

Rating

Fluorinated polymer, negative photosensitive resin... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluorinated polymer, negative photosensitive resin..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorinated polymer, negative photosensitive resin... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2655815