Fluoride additive containing chemical mechanical polishing slurr

Details Fluoride additive containing chemical mechanical polishing slurr Fluoride additive containing chemical mechanical polishing slurr

1996-06-06

1999-11-30

Nguyen, Nam

Compositions

Etching or brightening compositions

Inorganic acid containing

438693, 438754, 51309, C09K 1300, C23F 300, H01L 21306

Patent

active

059936860

ABSTRACT:
A chemical mechanical polishing slurry comprising an oxidizing agent, a fluoride containing additive and an abrasive and a method for using the fluoride containing additive chemical mechanical polishing slurry to remove tungsten and titanium from substrates.

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