X-ray or gamma ray systems or devices – Specific application – Fluorescence
Patent
1997-05-19
1998-03-24
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Fluorescence
378210, G01N 23223
Patent
active
057321205
ABSTRACT:
A fluorescent X-ray analyzing apparatus includes a source of excitation (2) for irradiating a silicon-based sample (S) with primary X-rays (B2) to excite the silicon-based sample (S), a detector (4) for detecting fluorescent X-rays (B5) emitted from the silicon-based sample (S), and an analyzer (6) for analyzing elements contained in the silicon-based sample (S) based on a result of detection performed by the detector (4). The primary X-rays (B2) emitted from the source of excitation (2) have a wavelength higher than, but in the vicinity of a wavelength at an Si--K absorption edge so that generation of fluorescent X-rays (B5) of Si is suppressed to minimize a noise which would occur during detection of fluorescent X-rays (B5) of Na and Al to thereby accomplish an accurate analysis of a minute quantity of NA and Al contained in the sample (S).
REFERENCES:
patent: 5148457 (1992-09-01), Kubota et al.
patent: 5428656 (1995-06-01), Kira et al.
Matsumura Tsuyoshi
Miyazaki Kunihiro
Shimazaki Ayako
Shoji Takashi
Utaka Tadashi
Church Craig E.
Kabushiki Kaisha Toshiba
Rigaku Industrial Corporation
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