Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-05-22
1993-09-07
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, 356344, G01N 2726, G01N 27447
Patent
active
052425673
ABSTRACT:
A fluorescence pattern reading apparatus for reading a fluorescence pattern by exciting a fluorescence substance labeled on a sample developed into an electrophoresis pattern by electrophoresis of the sample has optical scanning mechanisms, a light-receiving unit, a photoelectric converting unit, and amplifiers. The mechanisms are to irradiate the gel in the direction of thickness of the gel by scanning the irradiation light for exciting the fluorescent substance of the fluorescence patter. The light-receiving unit is to receive the fluorescence by separating the fluorescence from the light scattered on the reading surface of the gel due to a spatial position relationship of a light-receiving path in which the light-receiving surface is set to exist in the direction different from the axis of the irradiation light. The photoelectric converting unit is to generate electric signals by converting light signals received by the light-receiving unit. The amplifiers are to generate electric signals of the fluorescence patter in order by amplifying the electric signals from the converting unit by the integral operation in synchronization with the scanning of the irradiation light.
REFERENCES:
patent: 4675095 (1987-06-01), Kambara et al.
patent: 4810348 (1989-03-01), Sarrine et al.
patent: 5069769 (1991-12-01), Fujimiya et al.
Fujimiya Hitoshi
Ishikawa Toshitaka
Mishima Hiromichi
Nasu Hisanori
Yuda Kouji
Hitachi Software Engineering Co. Ltd.
Niebling John
Starsiak Jr. John S.
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