Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-05-20
1992-03-31
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
250234, 356344, 36441301, B01D 6142, H01J 314, G01N 2100
Patent
active
051005298
ABSTRACT:
With respect to a gel which is mounted on a gel electrophoresis apparatus, a calibration process is provided before starting of measurement to obtain calibration data for bringing a portion of the gel irradiated with excitation light onto the optical axis of a light receiving optical system for each scanning point, to perform measurement while controlling relative positional relation between the optical path of the excitation light and the optical axis of the light receiving optical system through the calibration data. Displacement, which may be inevitably caused between the optical axis of the light receiving optical system and the position irradiated with the excitation light by errors in working, assembling and adjustment, is basically eliminated, and sensitiveness irregularity is also removed.
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European Search Report dated Oct. 4, 1991.
Klima William L.
Koestner Caroline
Niebling John
Shimadzu Corporation
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